Satoshi Higashiyama

Title: Satoshi Higashiyama: Innovator in Ceramic Substrate Technology

Introduction

Satoshi Higashiyama is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of ceramic substrate technology, particularly with his innovative approach to double-sided circuit substrates.

Latest Patents

Higashiyama holds a patent for a "Double-sided circuit non-oxide-based ceramic substrate and method for manufacturing same." The objective of this invention is to provide a double-sided circuit non-oxide-based ceramic substrate that excels in radiation properties while being cost-effective. This substrate features a high heat-conductive non-oxide-based ceramic material, which includes a through hole, a holding layer on the wall surface of the through hole, and an electro-conductive metal section that is securely held inside the through hole by the holding layer. Notably, this metal section does not contain any active metal. Additionally, the substrate is designed with thin film electrodes that shield the exposed end surfaces of both the holding layer and the electro-conductive metal section.

Career Highlights

Higashiyama is currently employed at Hitachi Power Solutions Co., Ltd., where he continues to develop and refine innovative technologies in the field of ceramics. His work has garnered attention for its practical applications and advancements in substrate manufacturing.

Collaborations

Throughout his career, Higashiyama has collaborated with esteemed colleagues, including Hideaki Takemori and Toru Itagaki. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Satoshi Higashiyama's contributions to ceramic substrate technology highlight his innovative spirit and dedication to advancing the field. His patent for a double-sided circuit non-oxide-based ceramic substrate represents a significant step forward in manufacturing efficiency and performance.