Company Filing History:
Years Active: 1999-2001
Title: Satoshi Bannai: Innovator in Plasma Control Technology
Introduction
Satoshi Bannai is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of plasma control technology, holding two patents that showcase his innovative approach to this complex area of research.
Latest Patents
Bannai's latest patents focus on a method and apparatus for plasma control. The invention provides a method for plasma control, in which an electric field is generated in the direction perpendicular to the surface of an object to be processed in a plasma atmosphere generated in a processing chamber. Additionally, another electric field is generated in the direction parallel to the surface. The direction of ions or electrons in the plasma atmosphere is controlled by managing the composite electric field composed of both electric fields. The invention also includes an apparatus for plasma control, equipped with a perpendicular electric field generating means and a parallel electric field generating means.
Career Highlights
Satoshi Bannai is currently employed at Sony Corporation, where he continues to develop and refine his innovative technologies. His work has contributed to advancements in various applications of plasma technology, enhancing the capabilities of electronic devices and systems.
Collaborations
Bannai has collaborated with notable colleagues, including Toshiro Kisakibaru and Akira Kojima. Their combined expertise has fostered a productive environment for innovation and development in their respective fields.
Conclusion
Satoshi Bannai's contributions to plasma control technology exemplify the spirit of innovation. His patents reflect a deep understanding of the complexities involved in plasma processing, and his work at Sony Corporation continues to push the boundaries of technology.