Company Filing History:
Years Active: 2020-2023
Title: Innovations of Sang Kug Chung
Introduction
Sang Kug Chung is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of self-cleaning technologies, holding a total of 3 patents. His work focuses on innovative methods that utilize electrical and mechanical oscillation for cleaning applications.
Latest Patents
One of his latest patents is a self-cleaning device and method using electrical oscillation and mechanical oscillation. This invention comprises at least one first electrode on a solid material layer, a first dielectric layer on the first electrode, a hydrophobic layer on the first dielectric layer, and at least one mechanical oscillation unit. The device generates electrical oscillation to move droplets horizontally, merging them on the hydrophobic layer. The mechanical oscillation unit then moves the merged droplets in a specific direction or atomizes them to facilitate cleaning. Another significant patent is a cleaning apparatus and method designed for glass used in cars or cameras. This apparatus includes glass, multiple electrodes arranged in series on the glass, a dielectric layer, and a hydrophobic layer. The droplets formed on the hydrophobic layer move towards the outer edge of the glass by applying varying direct current voltages to the electrodes.
Career Highlights
Sang Kug Chung has worked with the Myongji University Industry and Academia Cooperation Foundation and Microsystems, Inc. His experience in these organizations has contributed to his innovative research and development in cleaning technologies.
Collaborations
He has collaborated with notable individuals such as Kang Yong Lee and Dae Young Lee, further enhancing his work in the field.
Conclusion
Sang Kug Chung's contributions to self-cleaning technologies demonstrate his innovative spirit and commitment to advancing practical solutions. His patents reflect a deep understanding of electrical and mechanical principles, paving the way for future advancements in cleaning applications.