Sang-Joon Yoon

Title: The Innovative Contributions of Sang-Joon Yoon

Introduction

Sang-Joon Yoon is a notable inventor based in Osan, South Korea. He has made significant contributions to the field of plasma etching technology, particularly in the manufacturing of photomasks. His work is recognized for its innovative approach and practical applications in the semiconductor industry.

Latest Patents

Sang-Joon Yoon holds a patent for a "Plasma etching chamber and method for manufacturing photomask using the same." This invention involves a plasma etching chamber designed for etching processes in photomask manufacturing. The chamber features an electrode with a supporting surface for a photomask substrate, a heat transfer element along the peripheral edge, and a heater to supply heat. The method includes forming a shading layer on a transparent substrate and etching it using plasma, ensuring that the temperature at the peripheral edge is maintained higher than at the center of the substrate. This innovative approach enhances the efficiency and quality of photomask production.

Career Highlights

Sang-Joon Yoon is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to contribute to advancements in technology and innovation, particularly in the area of plasma etching.

Collaborations

Throughout his career, Sang-Joon Yoon has collaborated with talented individuals such as Jeong-Yun Lee and Jin-Min Kim. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Sang-Joon Yoon's contributions to the field of plasma etching and photomask manufacturing highlight his role as an influential inventor. His innovative patent and work at Samsung Electronics Co., Ltd. demonstrate his commitment to advancing technology in the semiconductor industry.