Sang-Gyo Chung

Title: Innovations of Sang-Gyo Chung in Semiconductor Technology

Introduction

Sang-Gyo Chung is a prominent inventor based in Seoul, South Korea. He is known for his contributions to the field of semiconductor technology. His innovative methods have significantly advanced the way semiconductor devices are manufactured.

Latest Patents

Sang-Gyo Chung holds a patent for "Methods of forming patterns of semiconductor devices." This patent describes a method for forming fine patterns on semiconductor devices. The process involves creating a hard mask layer on an etch target that includes first and second regions. The hard mask layer features first and second preliminary mask patterns. A spacer layer is then formed on these preliminary mask patterns. The spacer layer and the preliminary mask patterns are partially removed to create first and second spacers on the sidewalls of the preliminary mask patterns. Notably, the second spacer in the second region has a top surface that is higher than that of the first spacer in the first region. This height difference allows for the formation of distinct patterns in both regions, facilitating the creation of fine patterns in semiconductor devices.

Career Highlights

Sang-Gyo Chung is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. He has made significant contributions to the development of advanced manufacturing techniques.

Collaborations

Throughout his career, Sang-Gyo Chung has collaborated with notable colleagues, including Jong-Sub Lee and Kyoung-Ha Eom. These collaborations have further enhanced his research and development efforts in semiconductor technology.

Conclusion

Sang-Gyo Chung's innovative methods in semiconductor device manufacturing have made a lasting impact on the industry. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to innovation.