New Orleans, LA, United States of America

Samuel C Ruffner


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Samuel C. Ruffner

Introduction

Samuel C. Ruffner is a notable inventor based in New Orleans, LA. He has made significant contributions to the field of materials science, particularly in the development of advanced polyimide films. His work has implications for various applications, including electronics and aerospace.

Latest Patents

Ruffner holds a patent for "Laser-induced fabrication of metallic interlayers and patterns in polyimide films." This innovative process involves creating self-metallizing polyimide films by doping polyamic acid solutions with metallic ions and solubilizing agents. The film is then exposed to coherent light for a specific duration and subsequently cured. The resulting film features a metallic surface layer and a metallic subsurface layer, known as the interlayer. The interlayer contains a uniform dispersion of small metal particulates within the polymer, while the layer beneath it has larger metal particulates uniformly distributed. By adjusting the intensity or duration of exposure to coherent light, Ruffner provides three-dimensional control over metal formation within the film.

Career Highlights

Ruffner's career is marked by his association with the United States of America as represented by the Administrator of NASA. His work has been instrumental in advancing the understanding and application of polyimide films in various high-tech fields.

Collaborations

Ruffner has collaborated with esteemed colleagues, including Gilda A. Miner and Diane M. Stoakley. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion

Samuel C. Ruffner's innovative work in the field of materials science, particularly with polyimide films, showcases his significant contributions to technology and engineering. His patent reflects a deep understanding of material properties and their applications, paving the way for future advancements.

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