Company Filing History:
Years Active: 1976-1984
Title: The Innovative Journey of Samuel Berkman
Introduction
Samuel Berkman, an esteemed inventor based in Florham Park, NJ, has made significant contributions to the field of technology with a remarkable portfolio of 17 patents. His innovative spirit and technical expertise have led to advancements in various applications, particularly in chemical vapor deposition and consumer products.
Latest Patents
One of Berkman's latest inventions is a patent for a Chemical Vapor Deposition (CVD) reactor that focuses on the continuous deposition of epitaxial silicon. This state-of-the-art single chamber reactor is designed with three separate zones, which are organized by baffles or tubes that carry chemical source materials and a carrier gas in one stream, while controlling hydrogen gas in another. This innovative design allows for precise diffusion on heated wafers, facilitating the epitaxial deposition process in the intermediate zone before the wafers are cooled in the final zone using coolant gases. Furthermore, Berkman has also developed a CVD reactor intended for batch processing, embodying the principles of continuous deposition, which showcases his understanding of advanced semiconductor manufacturing techniques.
Career Highlights
Samuel Berkman's career has been marked by his association with renowned companies, including RCA Inc. His extensive experience has contributed significantly to the fields where his inventions find practical applications.
Collaborations
Throughout his journey, Berkman has collaborated with notable coworkers such as Harold E. Temple and Kyong-Min Kim. These collaborations have enriched his work and contributed to innovative breakthroughs in their shared fields.
Conclusion
Samuel Berkman's inventive contributions reflect his dedication to technological progress and innovation. With a solid foundation of patents and collaborations, he continues to influence the landscape of invention and holds a prominent position in the industry. His work in chemical vapor deposition and design showcases the potential for innovation that drives advancements in both the semiconductor and cosmetic industries.