Sam Yee

Title: Sam Yee - Innovator in Gas Treatment Technologies

Introduction

Sam Yee is a notable inventor based in Fremont, California. He has made significant contributions to the field of gas treatment technologies, particularly in the semiconductor manufacturing industry. His innovative approach focuses on improving the efficiency of effluent gas stream treatment.

Latest Patents

Sam Yee holds a patent for a "Method for point-of-use treatment of effluent gas streams." This system is designed to abate undesired components from gas streams, such as halocompounds, acid gases, silanes, and ammonia. The method involves scrubbing the effluent gas stream with an aqueous scrubbing medium. Notably, halocompounds like fluorine and chlorofluorocarbons can be effectively scrubbed in the presence of reducing agents such as sodium thiosulfate. The scrubbing system includes a first acid gas scrubbing unit operated in cocurrent gas/liquid flow and a second polishing unit operated in countercurrent gas/liquid flow. This design achieves high removal efficiency while minimizing water consumption. The system may also utilize removable insert beds of packing material, enhancing its effectiveness.

Career Highlights

Sam Yee is currently employed at Advanced Technology Materials, Inc. His work focuses on developing innovative solutions for gas treatment, which are crucial for maintaining environmental standards in semiconductor manufacturing. His expertise in this area has positioned him as a key player in the industry.

Collaborations

Sam has collaborated with notable colleagues, including Jose I Arno and Mark R Holst. These partnerships have contributed to the advancement of technologies in gas treatment and environmental protection.

Conclusion

Sam Yee's contributions to gas treatment technologies reflect his commitment to innovation and environmental sustainability. His patent and work at Advanced Technology Materials, Inc. demonstrate his significant impact on the semiconductor manufacturing industry.