Company Filing History:
Years Active: 2007
Title: Sae-il Son: Innovator in Semiconductor Technology
Introduction
Sae-il Son is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of metal interconnection layers. His innovative methods have the potential to enhance the performance and efficiency of semiconductor devices.
Latest Patents
Sae-il Son holds 1 patent for his invention titled "Method of forming metal interconnection layer of semiconductor device." This patent outlines various methods for forming metal interconnection layers, which are crucial for the functionality of semiconductor devices. The exemplary method described involves several steps, including the formation of an interlayer dielectric layer, the use of a hard mask layer, and the deposition and patterning of photoresist layers to create interconnection areas.
Career Highlights
Sae-il Son is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation, contributing to advancements that are essential for modern electronic devices.
Collaborations
Throughout his career, Sae-il Son has collaborated with notable colleagues, including Il-Goo Kim and Sang-rok Hah. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Sae-il Son's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of efficient and effective semiconductor devices.