Company Filing History:
Years Active: 2015
Title: The Innovative Contributions of Sadayasu Suyama
Introduction
Sadayasu Suyama is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate cleaning technology. His innovative approach has led to the development of a unique cleaning method that enhances the efficiency of substrate processing.
Latest Patents
Suyama holds a patent for a substrate cleaning method and substrate cleaning device. This invention involves a substrate that rotates while a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle then moves toward a position outside the substrate, allowing a gas nozzle to reach the position above the center of the rotating substrate. The gas/liquid supply nozzle temporarily stops, and an inert gas is discharged onto the center of the rotating substrate for a specified period. Afterward, the gas/liquid supply nozzle again moves toward the position outside the substrate. This innovative method improves the cleaning process, ensuring better substrate quality.
Career Highlights
Sadayasu Suyama is currently associated with Screen Semiconductor Solutions Co., Ltd. His work at this company has been instrumental in advancing substrate cleaning technologies. His dedication to innovation has positioned him as a key figure in the semiconductor industry.
Collaborations
Suyama has collaborated with notable colleagues such as Tadashi Miyagi and Masahiko Harumoto. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Sadayasu Suyama's contributions to substrate cleaning technology exemplify the impact of innovative thinking in the semiconductor industry. His patent reflects a commitment to enhancing processes that are crucial for high-quality substrate production.