St-Prex, Switzerland

Sébastien Dufey

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Koenig & Bauer-Aktiengesellschaft. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sébastien Dufey. Retrieved from https://idiyas.com/inventor/sébastien-dufey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Sébastien Dufey: Innovator in Security Elements

Introduction

Sébastien Dufey is a notable inventor based in St-Prex, Switzerland. He has made significant contributions to the field of security technology, particularly in the development of innovative security elements.

Latest Patents

Dufey holds a patent for a security element, which is detailed as a security document that includes a security element and a device and method for producing it. This patent describes a substrate that features a three-dimensional intaglio structure on one side. The security feature incorporates multiple ink groups, each containing raised image elements with different colors. These elements are strategically arranged to create an optically variable structure, enhancing the security of the document.

Career Highlights

Sébastien Dufey is currently employed at Koenig & Bauer Aktiengesellschaft, a company renowned for its expertise in printing technology. His work focuses on advancing security features that are crucial for preventing counterfeiting and ensuring document integrity.

Collaborations

Dufey collaborates with talented professionals in his field, including Daniel Chassot and Giovanni Galuffo. Their combined expertise contributes to the innovative projects at Koenig & Bauer.

Conclusion

Sébastien Dufey's work in security elements exemplifies the importance of innovation in protecting valuable documents. His contributions continue to shape the future of security technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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