Nara, Japan

Ryusuke Kita


Average Co-Inventor Count = 4.7

ph-index = 7

Forward Citations = 298(Granted Patents)


Location History:

  • Tenri, JP (1987 - 1989)
  • Chiba, JP (1991 - 1992)
  • Nara, JP (1991 - 1993)
  • Urayasu, JP (1993 - 1995)
  • Matsudo, JP (1997 - 1999)

Company Filing History:


Years Active: 1987-1999

Loading Chart...
14 patents (USPTO):Explore Patents

Title: Ryusuke Kita: Innovator in Dielectric Thin Film Technology

Introduction

Ryusuke Kita is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of dielectric thin film technology, holding a total of 14 patents. His work focuses on enhancing the performance and reliability of dielectric materials used in various electronic applications.

Latest Patents

One of his latest patents is for a dielectric thin film capacitor element. This invention provides a solution to suppress leak current from increasing over time while energizing at high temperatures. It boasts excellent insulating quality and reliability. The capacitor element is constructed by forming a lower electrode, a dielectric thin film, and an upper electrode on a substrate. The dielectric thin film is made of an oxide material composed of at least titanium and strontium, containing erbium. Another notable patent is a method for producing a dielectric thin film element. This method involves heating a film forming chamber and forming a thin film of dielectric, approximately 200 nm thick, through sputtering or another deposition method. After the film is formed, oxygen gas is introduced into the chamber to oxidize the film, resulting in excellent dielectric properties, such as a high dielectric constant and great dielectric strength.

Career Highlights

Throughout his career, Ryusuke Kita has worked with notable companies, including Sharp Corporation and Kobe Steel, Ltd. His expertise in dielectric materials has positioned him as a key figure in the development of advanced electronic components.

Collaborations

Ryusuke has collaborated with talented individuals in his field, including Shuhei Tsuchimoto and Shoei Kataoka. Their combined efforts have contributed to the advancement of dielectric thin film technology.

Conclusion

Ryusuke Kita's innovative work in dielectric thin film technology has led to significant advancements in electronic components. His patents reflect a commitment to improving the reliability and performance of dielectric materials. His contributions continue to influence the industry positively.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…