Ryuji Fujira

Title: Ryuji Fujira: Innovator in Copper Film Technology

Introduction

Ryuji Fujira is a notable inventor based in Niigata, Japan. He has made significant contributions to the field of materials science, particularly in the production of copper film-formed articles. His innovative approach has led to advancements that are valuable in various industrial applications.

Latest Patents

Ryuji Fujira holds a patent for a method for producing copper film-formed articles. This patent describes a process that involves coating a mixed solution containing at least one copper compound, such as copper hydroxide or organic acid copper salts, along with a polyhydric alcohol. The method requires applying this solution to a specific area of an article that has a heat deflection temperature of at least 165 degrees Celsius. The article is then heated to a temperature ranging from 165 degrees Celsius to the heat deflection temperature, maintaining this condition in a non-oxidizing atmosphere. This innovative technique enhances the production of copper film-formed moldings, which are essential in various applications.

Career Highlights

Ryuji Fujira is associated with Mitsubishi Gas Chemical Company, Inc., where he has been able to apply his expertise in materials science. His work has contributed to the company's reputation for innovation and quality in chemical products.

Collaborations

Ryuji has collaborated with notable colleagues, including Takamasa Kawakami and Kazuhiro Ando. These partnerships have fostered a creative environment that encourages the development of new technologies and methodologies.

Conclusion

Ryuji Fujira's contributions to the field of copper film technology exemplify the impact of innovative thinking in materials science. His patent and work at Mitsubishi Gas Chemical Company, Inc. highlight the importance of collaboration and creativity in driving advancements in technology.