Yokohama, Japan

Ryuichiro Takasaki

This inventor holds 10 USPTO granted patents. Top assignees: Mitsubishi Chemical Corporation, Mitsubishi Chemical Industries Limited. Active years: 1987-2003.


% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 7

Forward Citations = 151(Granted Patents)


Location History:

  • Machida, JP (1996)
  • Yokohama, JP (1987 - 2000)
  • Kanagawa, JP (1998 - 2003)

Company Filing History:


Years Active: 1987-2003

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10 patents (USPTO):Explore Patents

Title: Ryuichiro Takasaki: Innovator in Photosensitive Technology

Introduction

Ryuichiro Takasaki is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of photosensitive compositions and image-forming materials. With a total of 10 patents to his name, Takasaki has established himself as a key figure in innovation.

Latest Patents

Takasaki's latest patents include a groundbreaking photosensitive composition that comprises (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye, and (c) a photopolymerization initiator. Notably, the sensitizing dye is a phthalocyanine compound that shows maximum absorption within a range of 750 to 1,200 nm. This innovative approach enhances the efficiency and effectiveness of image-forming methods.

Career Highlights

Throughout his career, Ryuichiro Takasaki has worked with leading companies in the chemical industry, including Mitsubishi Chemical Corporation and Mitsubishi Chemical Industries Limited. His work has been instrumental in advancing technologies related to photosensitive materials.

Collaborations

Takasaki has collaborated with notable professionals in his field, including Tameichi Ochiai and Toshiyuki Urano. These collaborations have further enriched his research and development efforts.

Conclusion

Ryuichiro Takasaki's contributions to the field of photosensitive technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the industry. His work continues to influence the development of new materials and methods in image formation.

Profile summary based on public USPTO records.
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