Company Filing History:
Years Active: 2009
Title: Ryouji Matsui: Innovator in Extreme Ultraviolet Light Sources
Introduction
Ryouji Matsui is a prominent inventor based in Suita, Japan. He is known for his significant contributions to the field of extreme ultraviolet (EUV) light sources. His innovative work has implications for various applications, particularly in the semiconductor industry.
Latest Patents
Ryouji Matsui holds a patent for an extreme ultraviolet light source and its target. The objective of this invention is to provide a target that emits extreme ultraviolet light with high emission efficiency. The patent describes a solid target made of heavy metal or heavy-metal compound, with a density ranging from 0.5 to 80% of the crystal density. When irradiated with a laser beam, the target generates plasma from the heavy metal, emitting extreme ultraviolet light at a predetermined wavelength. This design allows for improved emission efficiency by controlling the space distribution of the generated plasma, thus minimizing energy loss.
Career Highlights
Ryouji Matsui is affiliated with Osaka University, where he continues to advance research in the field of extreme ultraviolet technology. His work has garnered attention for its potential to enhance the efficiency of light sources used in various high-tech applications.
Collaborations
Some of Ryouji Matsui's notable coworkers include Keiji Nagai and Hiroaki Nishimura. Their collaborative efforts contribute to the ongoing research and development in the field of extreme ultraviolet light sources.
Conclusion
Ryouji Matsui's innovative work in extreme ultraviolet light sources exemplifies the importance of research and development in advancing technology. His contributions are paving the way for more efficient light sources, which are crucial for the future of semiconductor manufacturing and other applications.