Company Filing History:
Years Active: 2016
Title: The Innovative Contributions of Ryosuke Kamiura
Introduction
Ryosuke Kamiura is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of capacitors, particularly focusing on enhancing their performance and durability. With a total of 2 patents to his name, Kamiura's work is recognized for its innovative approach to capacitor technology.
Latest Patents
Kamiura's latest patents include advancements in film capacitors and metalized film capacitors. The film capacitor he developed features a capacitor element that includes a dielectric film and a pair of electrode layers. These layers face each other across the dielectric film, with end-surface electrodes provided on both ends. Notably, at least one electrode layer mainly contains aluminum, along with zinc and magnesium. The design ensures that the peak atomic concentration of magnesium is closer to the surface than that of zinc, resulting in a film capacitor with high humidity resistance.
In addition, his metalized film capacitor consists of metalized films formed from an insulating dielectric film. A vapor deposited metal electrode is placed on the upper surface of this insulating film. The design includes a low resistance section made of an Al-Zn-Mg alloy, which is thicker than the center region and enhances the capacitor's humidity resistance.
Career Highlights
Ryosuke Kamiura is currently employed at Panasonic Intellectual Property Management Co., Ltd. His work at this esteemed company has allowed him to focus on innovative capacitor technologies that address the challenges of humidity resistance, making his inventions highly relevant in various applications.
Collaborations
Kamiura has collaborated with notable coworkers, including Hiroki Takeoka and Yukikazu Ohchi. Their combined expertise contributes to the advancement of capacitor technology and the successful development of innovative products.
Conclusion
Ryosuke Kamiura's contributions to capacitor technology through his patents reflect his commitment to innovation and excellence. His work not only enhances the performance of capacitors but also addresses critical challenges in the industry.