Ryosuke Ishido

Title: Ryosuke Ishido: Innovator in Capacitor Technology

Introduction

Ryosuke Ishido is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of capacitor technology. His innovative approach has led to the development of a unique capacitor design that enhances performance and efficiency.

Latest Patents

Ryosuke Ishido holds a patent for a capacitor and method for producing a capacitor. This invention includes a substrate with a first principal surface on one side and a second principal surface on the other side. The design features a plurality of first internal electrode forming penetrating holes and second internal electrode forming penetrating holes that penetrate through the substrate in the thickness direction. The first internal electrodes consist of conductors embedded inside the first internal electrode forming penetrating holes, while the second internal electrodes are constituted of conductors embedded inside the second internal electrode forming penetrating holes. The arrangement of these internal electrode forming penetrating holes is disposed in a lattice pattern when viewed from a normal direction orthogonal to the first principal surface. Ryosuke Ishido has 1 patent to his name.

Career Highlights

Ryosuke Ishido is currently employed at Rohm Co., Ltd., a company known for its advancements in semiconductor and electronic components. His work at Rohm has allowed him to focus on innovative capacitor designs that meet the demands of modern technology.

Collaborations

Ryosuke Ishido collaborates with Taketoshi Tanaka, a fellow innovator in the field. Their combined expertise contributes to the development of cutting-edge technologies in capacitors.

Conclusion

Ryosuke Ishido's contributions to capacitor technology exemplify the spirit of innovation. His patent and work at Rohm Co., Ltd. highlight his commitment to advancing electronic components.