Rynn Wang

Title: Rynn Wang: Innovator in Chamber Component Cleaning Methods

Introduction

Rynn Wang is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of chamber component cleaning, particularly through his innovative patent. His work focuses on improving the efficiency and effectiveness of cleaning methods used in various industrial applications.

Latest Patents

Rynn Wang holds a patent titled "Methods for removing deposits on the surface of a chamber component." This patent describes a method for removing deposits from the surface of a chamber component. The process involves receiving a chamber component and fixing it in a fixture. A slurry with a pH of about 5 to about 9 is then applied to the surface of the chamber component. The surface is polished using a polish pad and the slurry, ensuring that the surface roughness after polishing remains within about 10% of the roughness before polishing. This method effectively removes deposits from the surface of the chamber component. An alternative method is also presented, which involves heating the chamber component to a temperature between 500° C. and 1500° C.

Career Highlights

Rynn Wang is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions for the semiconductor industry. His expertise in cleaning methods has positioned him as a valuable asset to his team and the company.

Collaborations

Rynn has collaborated with talented coworkers such as Tuochuan Huang and Min Shen. Their combined efforts contribute to the advancement of technologies in their field.

Conclusion

Rynn Wang's innovative approach to cleaning chamber components showcases his dedication to improving industrial processes. His patent reflects a significant advancement in the field, and his work at Applied Materials, Inc. continues to influence the industry positively.