Company Filing History:
Years Active: 2014
Title: Ruzhi Wang: Innovator in Plasma Discharge Technology
Introduction
Ruzhi Wang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of plasma discharge technology. His innovative approach has led to advancements that enhance the uniformity of high-frequency plasma discharges.
Latest Patents
Ruzhi Wang holds a patent titled "Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation." This patent describes a method that utilizes a pair of parallel electrodes within a plasma discharge chamber. A high-frequency power supply feeds the electrodes, operating within a frequency range of 13.56 MHz to 160 MHz. The method involves automatic tuning control of the high-frequency electromagnetic field, which changes cyclically during plasma discharge. This technique ensures that the average plasma density between the electrodes remains uniform over time.
Career Highlights
Ruzhi Wang is affiliated with the Beijing University of Technology, where he continues to engage in research and development. His work focuses on improving plasma discharge processes, which have applications in various industries, including electronics and materials science.
Collaborations
Ruzhi Wang collaborates with notable colleagues, including Bo Wang and Lichun Xu. Their combined expertise contributes to the advancement of research in plasma technology.
Conclusion
Ruzhi Wang's innovative methods in plasma discharge technology exemplify the impact of research and development in modern science. His contributions are paving the way for future advancements in the field.