Company Filing History:
Years Active: 1983
Title: The Innovative Mind of Russell H. Rhoades: Revolutionizing Electrostatic Cassettes
Introduction: Russell H. Rhoades is an accomplished inventor based in Palo Alto, California, whose innovative work has made significant contributions to the field of particle beam lithography. With one notable patent to his name, Rhoades has demonstrated a keen understanding of the intricacies involved in electrostatic cassette technology and its applications in advanced manufacturing processes.
Latest Patents: Rhoades holds a patent for an "Electrostatic Cassette," which presents a groundbreaking assembly designed to enhance the processing of wafers in particle beam lithographic systems. This patent outlines an electrostatic cassette assembly featuring a cassette body with a central opening for wafer insertion, a charge plate equipped with dielectric materials for wafer support, and mechanisms to ensure both mechanical and electrostatic retention of the wafer during processing. The patent also details the application of a potential difference between the wafer and charge plate to achieve wafer flattening through Coulombic force, thus ensuring precision and stability.
Career Highlights: Rhoades is affiliated with the PerkinElmer Corporation, where his expertise and innovative ideas have contributed to the development of high-tech solutions in various scientific fields. With a strong foundation in electrostatic technologies, his work continues to influence the efficiency of wafer processing and related applications.
Collaborations: Throughout his career, Rhoades has collaborated with esteemed colleagues such as William A. Eckes and John W. Vorreiter. These collaborations have fostered a productive environment for innovation, empowering Rhoades to push the boundaries of technology in wafer processing and electrostatic design.
Conclusion: Russell H. Rhoades exemplifies the spirit of innovation in the field of electrostatic technologies. His patent for the electrostatic cassette represents not only a technical achievement but also a significant leap forward in the efficiency of particle beam lithography. With ongoing collaborations and a commitment to pushing technological boundaries, Rhoades continues to inspire future advancements in his field.