Beijing, China

Runlin He


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):

Title: The Innovative Contributions of Runlin He

Introduction

Runlin He, an inventive mind based in Beijing, China, has made notable strides in the field of technology and innovation. With a commitment to enhancing computational methods, Runlin has contributed significantly to the development of efficient systems in his workplace.

Latest Patents

Runlin He holds a patent for a "Preprocessing method and device for distance transformation." This patent reveals an advanced preprocessing method that includes several key steps: acquiring a first grid map, calculating parameters of a vehicle model, and determining the precision of a second grid map based on these parameters. Notably, the device is designed to enhance the speed of distance value determination for each grid cell during the transformation process, showcasing Runlin's focus on optimization in technology.

Career Highlights

Runlin is currently employed at Beijing Idriverplus Technology Co., where he utilizes his expertise to innovate within the realm of distance transformation technologies. His significant achievements in patenting new methods demonstrate his deep understanding of both theoretical and practical aspects of his field.

Collaborations

Throughout his career, Runlin He has collaborates with talented colleagues, including Bo Yan and Cheng Xu. Together, they contribute to the innovative projects at their company, drawing on each team member's strengths to develop sophisticated technological solutions.

Conclusion

Runlin He's innovative spirit and commitment to enhancing distance transformation methods underscore the importance of continued research and development in technology. His patent not only highlights his capabilities as an inventor but also positions him as a significant contributor to advancements in the industry. As he continues to work with skilled professionals, Runlin is poised to make even further impacts in the realm of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…