Run Wang

Title: The Innovations of Run Wang

Introduction

Run Wang is an accomplished inventor based in Guangzhou, China. He has made significant contributions to the field of ultraviolet LED technology. His innovative approach has led to the development of a unique ultraviolet LED chip that enhances performance and durability.

Latest Patents

Run Wang holds a patent for an ultraviolet LED chip and its manufacturing method. This invention features an epitaxial structure that is divided into two insulated structures, namely a first and a second epitaxial structure. The design includes an insulating layer and a groove contacting layer, which are strategically placed within the epitaxial structure. The N-type AlGaN layer extends through the groove contacting layer. This configuration allows for the formation of an LED and an electrostatic discharge (ESD) device, which work together to provide an electrostatic discharging channel. This innovation reduces the risk of damage to the ultraviolet LED chip caused by electrostatic discharges while increasing the forward voltage and antistatic intensity of the LED.

Career Highlights

Run Wang has demonstrated exceptional skill and creativity in his work. His patent reflects his deep understanding of semiconductor technology and his commitment to advancing the field of LED applications. His contributions have positioned him as a notable figure in the industry.

Collaborations

Run Wang has collaborated with talented individuals such as Miao He and Sipan Yang. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Run Wang's work in developing the ultraviolet LED chip showcases his inventive spirit and technical expertise. His contributions to the field are significant and continue to influence advancements in LED technology.