Beijing, China

Run Chen


 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016-2021

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Run Chen

Introduction

Run Chen is a prominent inventor based in Beijing, China. He has made significant contributions to the field of technology, particularly in the development of touch panels and exposure machines. With a total of 2 patents, his work showcases his expertise and innovative spirit.

Latest Patents

Run Chen's latest patents include a touch panel, a method for manufacturing the same, and a touch device. The method for manufacturing a touch panel involves forming a first touch electrode and a first auxiliary electrode on a base substrate. The first touch electrode is designed in a mesh shape, while the first auxiliary electrode is insulated and spaced apart from it. The process continues with the formation of a first insulating layer that covers the first touch electrode and exposes part of the first auxiliary electrode. A first metal layer is then applied, followed by patterning to create a second touch electrode in a mesh shape.

Another notable patent is a mask-mounting apparatus for an exposure machine. This apparatus includes a mask frame for securing a mask and a gas cell that supports the mask frame. A gas-supply unit is connected to the gas cell through a gas-supply pipeline, which is equipped with a pneumatic switch valve. This design ensures that, in the event of a gas supply interruption, the pneumatic switch valve will seal the gas in the gas cell, preventing detachment of the mask frame.

Career Highlights

Throughout his career, Run Chen has worked with notable companies such as BOE Technology Group Co., Ltd. and Hefei Xinsheng Optoelectronics Technology Co., Ltd. His experience in these organizations has contributed to his development as an inventor and has allowed him to refine his skills in technology and innovation.

Collaborations

Run Chen has collaborated with talented individuals in his field, including Weijie Ma and Cui Chen. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Run Chen's contributions to technology through his patents and collaborations highlight his innovative spirit and dedication to advancing the field. His work continues to influence the development of new technologies and solutions in the industry.

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