Beijing, China

Ruirui Hao


Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2024

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: Ruirui Hao: Innovator in Display Technology

Introduction

Ruirui Hao is a prominent inventor based in Beijing, China. He has made significant contributions to the field of display technology, particularly through his innovative patents. With a focus on enhancing display substrates, Hao's work has implications for various applications in modern electronics.

Latest Patents

Hao holds a patent for a display substrate and display panel. This patent, which is categorized under the field of display technology, outlines a display substrate that includes a display region and a peripheral region surrounding it. The substrate consists of a base substrate and multiple insulating layers arranged sequentially away from the base substrate. Each insulating layer is strategically located in both the display and peripheral regions, with protrusion structures positioned between adjacent insulating layers in the peripheral region. This innovation aims to improve the performance and efficiency of display panels.

Career Highlights

Throughout his career, Ruirui Hao has worked with notable companies in the display technology sector. He has been associated with Ordos Yuansheng Optoelectronics Co., Ltd. and BOE Technology Group Co., Ltd. These experiences have allowed him to refine his expertise and contribute to advancements in display technology.

Collaborations

Hao has collaborated with talented individuals in his field, including Hong Liu and Jingyi Xu. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Ruirui Hao is a key figure in the realm of display technology, with a patent that showcases his innovative approach to display substrates. His work continues to influence the industry, and his collaborations with other professionals further enhance the potential for future advancements.

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