Company Filing History:
Years Active: 1997-1998
Title: Rudolf Thyen: Innovator in Resistive Film Technology
Introduction
Rudolf Thyen is a notable inventor based in Bothkamp, Germany. He has made significant contributions to the field of resistive film technology, holding a total of 3 patents. His work has implications in various applications, showcasing his innovative spirit and technical expertise.
Latest Patents
Thyen's latest patents include a resistive film that comprises carbon (40-95 at. %), one or more metals (4-60 at. %), and hydrogen (1-30 at. %). This film exhibits a resistivity exceeding 1000 μΩ.cm and a temperature coefficient TC ranging from -100 to +100 ppm/K. Another notable patent is for a resistive component that includes one or more resistive films, potentially applied on a substrate. At least one of these films is based on CrSi, containing 5-50 at. % Cr, 10-70 at. % Si, 5-50 at. % O, and at least one element from the group of B, C, and N in a concentration of 1-50 at. %. The innovative properties of this resistive component stem from the reactive incorporation of oxygen and carbon or nitrogen into the resistive films.
Career Highlights
Rudolf Thyen is associated with U.S. Philips Corporation, where he has been able to apply his expertise in developing advanced resistive technologies. His work has contributed to the company's reputation for innovation in electronic components.
Collaborations
Thyen has collaborated with notable colleagues, including Rainer Veyhl and Heinz Dimigen. Their combined efforts have furthered advancements in resistive film technology.
Conclusion
Rudolf Thyen's contributions to resistive film technology highlight his role as an influential inventor. His patents reflect a commitment to innovation and excellence in the field.