Rudolf G Frieser

Title: Rudolf G Frieser: Innovator in Photoresist Technology

Introduction

Rudolf G Frieser is a notable inventor based in Concord, NC (US), recognized for his contributions to the field of photoresist technology. He holds two patents that showcase his innovative approach to enhancing the performance of organic photoresists in various applications.

Latest Patents

Frieser's latest patents focus on the development of photoresists that are resistant to etching in oxygen-containing plasmas. This modified organic photoresist is particularly useful for masking and etching organic polymer materials in very-large-scale integration (VLSI) and advanced packaging applications. The invention involves the addition of a phosphorous-containing compound to a conventional photoresist. This compound is effective in preventing etching of the modified photoresist in an oxygen-containing plasma while maintaining the photosensitivity, elasticity, and adhesion of the etch-resistant film formed during exposure.

Career Highlights

Throughout his career, Rudolf G Frieser has worked with several prominent organizations, including the Microelectronics Center of North Carolina, the University of North Carolina at Charlotte, and MCNC. His work in these institutions has significantly contributed to advancements in microelectronics and materials science.

Collaborations

Frieser has collaborated with notable colleagues such as Farid M Tranjan and Thomas D DuBois, further enhancing the impact of his work in the field.

Conclusion

Rudolf G Frieser is a distinguished inventor whose work in photoresist technology has paved the way for advancements in VLSI and packaging applications. His innovative patents reflect his commitment to improving material performance in the microelectronics industry.