Palo Alto, CA, United States of America

Roy R Wang

This inventor holds 2 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignee: Brooks Automation US, LLC. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roy R Wang. Retrieved from https://idiyas.com/inventor/roy-r-wang-d12b5ln4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Roy R Wang in Semiconductor Technology**

Introduction

Roy R Wang, based in Palo Alto, CA, is a notable inventor who has made significant contributions to the field of semiconductor technology. With one patent to his name, Wang's work focuses on enhancing the efficiency and effectiveness of wafer mapping processes, which are crucial for semiconductor manufacturing.

Latest Patents

Wang's patent, titled "Substrate mapping apparatus and method therefor," describes a sophisticated semiconductor wafer mapping apparatus. This innovative system comprises a frame that forms a wafer load opening, allowing for seamless communication with a load station for a substrate carrier. The substrate carrier is designed to hold multiple wafers, which are vertically distributed to facilitate loading through the wafer load opening. A key feature of this apparatus is its movable arm, designed to move relative to the wafer load opening, equipped with an end effector for loading wafers from the substrate carrier. Additionally, an image acquisition system composed of an array of cameras ensures precise visualization through the wafer load opening, enhancing the overall mapping process.

Career Highlights

Roy R Wang works at Brooks Automation US, LLC, a leading company in the automation and semiconductor industries. His expertise and innovative mindset have played a pivotal role in the development of advanced technologies that streamline wafer handling and mapping processes. The success of his patent underscores his dedication to pushing the boundaries of semiconductor innovation.

Collaborations

During his time at Brooks Automation, Wang has collaborated with talented individuals such as Radik Sunugatov and Karl Shieh. These collaborations have fostered an environment of creativity and innovation, as they work together to tackle complex challenges in the semiconductor field.

Conclusion

Roy R Wang's contributions to semiconductor technology, exemplified through his patent on substrate mapping apparatus, reflect his commitment to innovation and excellence in the industry. As technology continues to evolve, his work will undoubtedly play a crucial role in advancing semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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