Fairfield, CT, United States of America

Ronald Michael Martino


Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 78(Granted Patents)


Location History:

  • Fairfield, CT (US) (1996 - 1997)
  • Fairfield County, CT (US) (1997)

Company Filing History:


Years Active: 1996-1997

Loading Chart...
3 patents (USPTO):

Title: Innovations of Ronald Michael Martino

Introduction

Ronald Michael Martino is a notable inventor based in Fairfield, CT (US). He has made significant contributions to the field of optical lithography, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of photomask illumination techniques.

Latest Patents

Martino's latest patents include a "Diffraction pupil filler modified illuminator for annular pupil fills." This invention achieves uniform illumination of a photomask in optical lithography by utilizing annular illumination of the conjugate pupil plane in a lithography tool. A spinning diffraction filter is integrated into a stepper to provide annular illumination on a time-averaged basis. This innovative approach allows for resolution enhancement without significant loss of light intensity and does not require redesigning the illuminator in the photolithographic exposure tool.

Another significant patent is "Continuous scale optical proximity correction by mask maker dose." This invention manipulates energy levels to modify the resultant photomask representation in a controlled manner. The final image in semiconductor device fabrication is made to closely resemble an ideal image. By assigning relative mask writer doses, feature sizes and shapes can be modified without physically altering the layout designs. This method allows for continuous scale line width variation for all features without impacting data volume.

Career Highlights

Martino is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of optical technologies. His work has been instrumental in advancing the capabilities of photolithography, which is crucial for semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Lars W Liebmann and Joseph P Kirk, who have collaborated with him on various projects within the company.

Conclusion

Ronald Michael Martino's contributions to optical lithography through his patents demonstrate his commitment to innovation in the field. His work not only enhances manufacturing processes but also sets a foundation for future advancements in semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…