Company Filing History:
1 out of 902 
1 out of 3,975 
Years Active: 1990-1992
Title: The Innovations of Ronald G Musket
Introduction
Ronald G Musket is a notable inventor based in San Ramon, CA (US). He has made significant contributions to the field of materials science, particularly in the development of processes for forming pure layers in substrates. With a total of 2 patents to his name, Musket's work has implications for various applications, including implantable elements.
Latest Patents
Musket's latest patents focus on processes for forming substantially pure layers in substrate materials. The first patent describes a method for creating a substantially pure monocrystalline layer of an implantable element in a monocrystalline substrate material. This process involves selecting an implantable element and substrate material that have limited mutual solubility and do not form intermediate phases. The method includes implanting a sufficient amount of the implantable element and may involve an annealing step to achieve the desired layer. The second patent outlines a similar process, emphasizing the importance of the selection of materials and the implantation technique to ensure the purity of the layer formed.
Career Highlights
Throughout his career, Ronald G Musket has worked with prominent organizations, including the United States of America as represented by the Department of Energy and the United States of America as represented by the United States. His work in these institutions has allowed him to contribute to significant advancements in technology and materials science.
Collaborations
Musket has collaborated with notable professionals in his field, including David W Brown and Zuhair A Munir. These collaborations have likely enriched his research and development efforts, leading to innovative solutions in his area of expertise.
Conclusion
Ronald G Musket's contributions to the field of materials science through his patents and collaborations highlight his role as an influential inventor. His innovative processes for forming pure layers in substrates have the potential to impact various technological applications significantly.