Rohan Dhall

Title: **Inventor Rohan Dhall: A Pioneer in Transition Metal Dichalcogenides**

Introduction

Rohan Dhall, a prominent inventor based in Los Angeles, California, has made significant contributions to the field of materials science, particularly with his innovations involving transition metal dichalcogenides (TMDCs). With a keen focus on enhancing the performance of electronic devices, Dhall's work brings forth promising advancements for various applications.

Latest Patents

Dhall holds a noteworthy patent titled "Bulk direct gap MoS2 by plasma induced layer decoupling." This invention addresses the issue of interlayer separation in bulk direct band gap TMDCs, achieving an increase of at least 0.5, 1, or even 3 angstroms beyond the bulk threshold. His patent encompasses two primary materials—molybdenum disulfide (MoS2) and tungsten diselenide (WSe)—with the potential to improve device functionalities. The introduction of oxygen between the interlayers plays a crucial role in this enhancement. The applications of his TMDC inventions include optoelectronic devices such as LEDs, solid-state lasers, photodetectors, solar cells, FETs, thermoelectric generators, and thermoelectric coolers. A key method outlined in his patent describes exposing bulk direct TMDC to remote oxygen plasma to achieve these remarkable improvements in photoluminescence efficiency and carrier lifetimes.

Career Highlights

Rohan Dhall's career includes significant tenures at reputable research institutions, namely the University of Southern California and the University of California. His work in these esteemed organizations has greatly influenced scientific understanding and development in the area of materials science and engineering.

Collaborations

Throughout his career, Dhall has collaborated with distinguished coworkers, including Stephen B. Cronin and Roger Lake. These collaborations have undoubtedly enriched his research and contributed to the innovations he has brought to light, further showcasing the importance of teamwork in scientific advancement.

Conclusion

Rohan Dhall's pioneering efforts in the field of transition metal dichalcogenides demonstrate his commitment to advancing technology through innovative solutions. His patent on bulk direct gap MoS2 highlights the significant potentials of TMDCs in various optoelectronic applications. As Dhall continues to collaborate with leading experts, the future looks promising for further innovations stemming from his work.