Amadora, Portugal

Rogério Rocha

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rogério Rocha. Retrieved from https://idiyas.com/inventor/rogério-rocha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Rogério Rocha: Innovator at Samsung Electronics

Introduction

Rogério Rocha is a notable inventor based in Amadora, Portugal. He has made significant contributions to the field of technology, particularly through his work at Samsung Electronics. With a focus on enhancing user experience, his innovations have garnered attention in the industry.

Latest Patents

Rogério Rocha holds a patent for a "Display screen or portion thereof with graphical user interface." This invention showcases his commitment to improving the functionality and aesthetics of display technology. His patent portfolio includes 1 patent, reflecting his innovative spirit and technical expertise.

Career Highlights

Throughout his career, Rogério has been associated with Samsung Electronics Co., Ltd., a leading global technology company. His role at Samsung has allowed him to work on cutting-edge projects that push the boundaries of technology. His contributions have played a vital role in the development of user-friendly interfaces.

Collaborations

Rogério has collaborated with talented individuals such as Neil Everette and Maverick Velasco. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Rogério Rocha is a distinguished inventor whose work at Samsung Electronics has made a significant impact on display technology. His patent and collaborations highlight his dedication to innovation and excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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