Company Filing History:
Years Active: 1990-1991
Title: Innovations by Rodney W Stockstad
Introduction
Rodney W Stockstad is a notable inventor based in Plymouth, MN (US). He has made significant contributions to the field of coating compositions, particularly in enhancing chip resistance. With a total of 2 patents, his work has had a considerable impact on the industry.
Latest Patents
Stockstad's latest patents include innovative formulations aimed at improving the durability of coatings. One of his patents focuses on cationic electrodeposition compositions for producing chip-resistant coatings. This invention enhances the chip resistance of alkyd-type electro-depositable coating compositions by incorporating an ethylenically unsaturated, addition-polymerizable monomer or oligomer. This component has a substantially linear backbone and a molecular weight of at least about 150, making it reactive with fatty acid unsaturation of the alkyd. Another significant patent involves modified alkyd cationic electrodeposition compositions, which are derived from the reaction of a base alkyd with ethylenically unsaturated monomers, including an amine-functional monomer. This formulation provides improved resistance to chipping by chemically incorporating one or more selected chemical agents through covalent bonding.
Career Highlights
Rodney W Stockstad has had a successful career at The Valspar Corporation, where he has been instrumental in developing advanced coating technologies. His expertise in cationic electrodeposition has positioned him as a key figure in the field.
Collaborations
Throughout his career, Stockstad has collaborated with talented individuals such as Philip J Ruhoff and James A Prevost. These partnerships have contributed to the advancement of innovative coating solutions.
Conclusion
Rodney W Stockstad's contributions to the field of coating compositions demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and a dedication to improving product performance.