Minneapolis, MN, United States of America

Rodney E Reeve




Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Rodney E. Reeve

Introduction

Rodney E. Reeve is a notable inventor based in Minneapolis, MN (US). He has made significant contributions to the field of plasma technology, particularly with his innovative designs and patents. His work focuses on enhancing the durability and efficiency of plasma arc torches.

Latest Patents

One of Rodney E. Reeve's key patents is the "Plasma torch with corrosive protected collimator." This invention addresses the issue of premature failure of the collimator in transferred plasma arc torches due to corrosion. The patent describes the application of an anti-corrosive covering on the exposed face surface and a portion of the inner exit bore of the collimator. Various methods for producing the collimator with an anti-corrosive coating are detailed, including electroplating, electroless plating, flame spraying, plasma spraying, plasma transferred arc, hot isostatic pressing, and explosive cladding.

Career Highlights

Rodney E. Reeve has established himself as a key figure in the field of plasma technology. His innovative approach to solving corrosion issues in plasma torches has garnered attention and respect within the industry. He is currently associated with Phoenix Solutions Co., where he continues to develop and refine his inventions.

Collaborations

Rodney has worked alongside talented individuals such as Gary J. Hanus and Todd J. Stahl. Their collaborative efforts have contributed to advancements in plasma technology and have helped in the successful development of innovative solutions.

Conclusion

Rodney E. Reeve's contributions to plasma technology through his innovative patents and collaborative efforts highlight his importance in the field. His work not only addresses critical issues but also paves the way for future advancements in plasma applications.

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