Company Filing History:
Years Active: 2002-2006
Title: The Innovative Contributions of Rod Kistler
Introduction
Rod Kistler, an inventive mind based in Los Gatos, California, has made significant strides in the field of chemical mechanical polishing with a remarkable portfolio of 10 patents. His innovations demonstrate a keen understanding of engineering principles and a commitment to enhancing semiconductor manufacturing processes.
Latest Patents
One of Kistler's latest innovations is a "Method for Chemical Mechanical Planarization," designed to enhance the efficiency of chemical mechanical planarization (CMP) processes. This invention features a sophisticated apparatus that includes a cylindrical frame, a polishing membrane, and a pad support capable of differential flexing. The design allows for optimized air pressure application during the CMP process, significantly improving the results. Additionally, Kistler's method using active retainer rings aims to bolster edge performance in CMP applications. By providing precise control over the positions of retaining rings and polishing belts, this method ensures consistent removal rates at the wafer edges.
Career Highlights
Rod Kistler is a prominent engineer at Lam Research Corporation, where he utilizes his expertise to advance semiconductor processing technologies. His ten patents encapsulate a variety of methods and apparatuses that contribute to the refinement of CMP processes, positioning him as a leading inventor in the industry.
Collaborations
Throughout his career, Kistler has teamed up with notable coworkers, including Yehiel Gotkis and John Boyd. Their collaborative efforts have fostered an innovative environment, driving advancements in chemical mechanical planarization and related technologies.
Conclusion
Rod Kistler's inventive contributions significantly shape the landscape of semiconductor manufacturing through targeted innovations in chemical mechanical polishing. His dedication to research and development continues to pave the way for future advancements, benefiting both the industry and technology as a whole.