Roberta R Nolan-Lobmeyer

Title: Roberta R Nolan-Lobmeyer: Innovator in Wafer Cleaning Processes

Introduction

Roberta R Nolan-Lobmeyer is a notable inventor based in West Melbourne, FL (US). She has made significant contributions to the field of semiconductor processing, particularly in the area of wafer cleaning techniques. Her innovative approach has led to advancements that enhance the quality and efficiency of silicon wafer preparation.

Latest Patents

Roberta holds a patent for the SC-2 based pre-thermal treatment wafer cleaning process. This process involves pre-heat-treatment processing of a silicon wafer to grow a hydrophilic oxide layer. The initial step includes contacting the wafer with a pre-clean SC-1 bath, resulting in a highly particle-free silicon wafer surface. Following a deionized water rinse, the wafer is treated with an aqueous solution containing hydrofluoric acid and hydrochloric acid to eliminate metallic-containing oxide from the surface. To grow the hydrophilic oxide layer, an SC-2 bath, which contains hydrogen peroxide and a dilute concentration of metal-scouring hydrochloric acid, is utilized. The resulting hydrophilic silicon oxide layer has a metal concentration no greater than 1×10⁹. This innovative cleaning process increases the diffusion length of minority carriers from approximately 500-600 microns to a range of 800-900 microns.

Career Highlights

Roberta is currently employed at Harris Corporation, where she continues to develop and refine her innovative processes. Her work has been instrumental in advancing semiconductor technology, making her a valuable asset to her team and the industry.

Collaborations

Roberta has collaborated with notable colleagues, including Jack H Linn and George V Rouse, contributing to a dynamic and innovative work environment.

Conclusion

Roberta R Nolan-Lobmeyer is a pioneering inventor whose work in wafer cleaning processes has significantly impacted the semiconductor industry. Her innovative techniques and dedication to excellence continue to drive advancements in technology.