Company Filing History:
3 out of 10 
1 out of 832,718 Years Active: 1986-1987
Title: The Innovations of Robert W. Stitz
Introduction
Robert W. Stitz is a notable inventor based in Mesa, Arizona, recognized for his contributions to the field of chemical vapor deposition technology. With a total of four patents to his name, Stitz has made significant advancements in semiconductor manufacturing processes.
Latest Patents
Stitz's latest patents include a CVD heat source and a CVD plasma reactor. The CVD heat source patent describes a method for chemical vapor deposition on a semiconductor wafer using a plasma reactor equipped with multiple lamps for radiantly heating the wafer. This innovative design incorporates calibrated temperature sensing means that are remote from the wafer to control its heating effectively. Gases are introduced through a series of tubes that extend radially inward from the chamber's sides. Additionally, a baffle is included to create an antechamber, which enhances the uniformity of the deposition process. The plasma is ignited for a limited duration during the deposition cycle specifically for tungsten disilicide. The CVD plasma reactor patent shares similar features, emphasizing the importance of precise temperature control and gas distribution for optimal semiconductor fabrication.
Career Highlights
Throughout his career, Robert W. Stitz has worked with various companies, including Spectrum CVD, Inc. His experience in the industry has allowed him to refine his expertise in chemical vapor deposition technologies, contributing to advancements in semiconductor manufacturing.
Collaborations
Stitz has collaborated with notable colleagues such as J.B. Price and Matthew L. Bunch, further enhancing his work in the field of semiconductor technology.
Conclusion
Robert W. Stitz's innovative patents and career achievements highlight his significant role in advancing chemical vapor deposition technology. His work continues to influence the semiconductor industry, showcasing the importance of innovation in this critical field.
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