Company Filing History:
Years Active: 2001-2007
Title: Innovations of Robert R Mandal
Introduction
Robert R Mandal is a notable inventor based in Saratoga, CA (US). He has made significant contributions to the field of materials science, particularly in the development of low dielectric constant films. With a total of 6 patents to his name, Mandal's work has had a substantial impact on the semiconductor industry.
Latest Patents
One of Mandal's latest patents is focused on CVD plasma-assisted low dielectric constant films. This invention describes a method and apparatus for depositing a low dielectric constant film through the reaction of an organosilane or organosiloxane compound with an oxidizing gas at a low RF power level ranging from 10 to 250 W. The resulting oxidized organosilane or organosiloxane film exhibits excellent barrier properties, making it suitable for use as a liner or cap layer adjacent to other dielectric layers. Additionally, this film can serve as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures. The films also provide superior adhesion between different dielectric layers, enhancing the overall performance of semiconductor devices.
Career Highlights
Mandal is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to further develop his innovative ideas and contribute to advancements in technology.
Collaborations
Throughout his career, Mandal has collaborated with esteemed colleagues such as David Wingto Cheung and Wai-Fan Yau. These collaborations have fostered a creative environment that has led to the successful development of various technologies.
Conclusion
Robert R Mandal's contributions to the field of low dielectric constant films and his innovative patents have positioned him as a key figure in the semiconductor industry. His work continues to influence advancements in materials science and technology.
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