Robert M Ruppell

Title: The Innovations of Robert M Ruppell

Introduction

Robert M Ruppell is a notable inventor based in Cupertino, CA (US). He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his innovative approach to substrate processing systems.

Latest Patents

Ruppell's latest patents include an improved substrate processing system designed for double-sided scrubbing of semiconductor substrates. This system features wet stations with covers that prevent accumulated liquid from dripping outside and minimize dripping on the substrates. Transport tunnels are integrated between modules to prevent leakage, ensuring a stable substrate transfer mechanism that moves along a rail. The processing system includes two brush stations within a single enclosure, and sensors are strategically placed throughout the system to detect the presence of wafers. In the sender station, two sensors work together to enhance reliability, while the dry station is equipped with a shielded heating lamp to reduce particulate contamination. Additionally, various flow meters are mounted on a transparent panel for easy hook-up, and an airflow control bulkhead is implemented to maintain lower contamination levels in the clean side of the system.

Career Highlights

Ruppell is currently employed at Ontrak Systems, Inc., where he continues to develop innovative solutions in substrate processing. His work has significantly impacted the efficiency and reliability of semiconductor manufacturing processes.

Collaborations

Some of Ruppell's notable coworkers include David L Thrasher and Lynn S Ryle, who have collaborated with him on various projects within the company.

Conclusion

Robert M Ruppell's contributions to semiconductor processing through his innovative patents and work at Ontrak Systems, Inc. highlight his importance in the field. His advancements continue to influence the industry and improve manufacturing processes.