Company Filing History:
Years Active: 1999
Title: Innovations of Robert M Rivera
Introduction
Robert M Rivera is an accomplished inventor based in San Leandro, CA. He has made significant contributions to the field of chemical-mechanical polishing. His innovative techniques have paved the way for advancements in substrate surface polishing.
Latest Patents
Robert M Rivera holds 1 patent for his invention titled "Control of chemical-mechanical polishing rate across a substrate surface." This patent describes a technique for controlling the polishing rate across a substrate surface during chemical-mechanical polishing (CMP). The invention aims to achieve uniform polishing of the substrate surface. It features a support housing that underlies a polishing pad, which includes multiple openings for dispensing a pressurized fluid. These openings are arranged in a pre-configured pattern to effectively dispense fluid to the underside of the pad opposite the substrate surface being polished. The design allows for separate channels for each grouping of openings, enabling independent control of fluid pressure for each group.
Career Highlights
Robert M Rivera is currently employed at Lam Research Corporation, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of polishing techniques used in the industry.
Collaborations
Robert has collaborated with notable colleagues, including Anil K Pant and Joseph R Breivogel. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Robert M Rivera's contributions to the field of chemical-mechanical polishing demonstrate his commitment to innovation and excellence. His patented techniques are vital for achieving uniformity in substrate surface polishing, showcasing the importance of his work in the semiconductor industry.