Company Filing History:
Years Active: 1983
Title: The Innovations of Robert M Booth, Jr.
Introduction
Robert M Booth, Jr. is an accomplished inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of technology, particularly in the area of silicon etching. His innovative work has led to the development of a unique patent that addresses critical challenges in the manufacturing process.
Latest Patents
Robert M Booth, Jr. holds a patent for a "Situ rate and depth monitor for silicon etching." This invention is an in situ thickness change monitor designed to determine thickness changes in opaque product materials, such as silicon, within chamber apparatuses like reactive ion etching systems. The patent describes a method where reference material with thickness change properties is deposited on a substrate, creating an optical monitor that exhibits an optical discontinuity. By directing light to this monitor, reflected beams produce intensity variations due to interference, which are indicative of the thickness of the reference material. This allows for the correlation of changes in the reference material's thickness to the product material's thickness changes.
Career Highlights
Robert M Booth, Jr. is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects and innovations. His work at IBM has allowed him to apply his expertise in technology and engineering to develop solutions that enhance manufacturing processes.
Collaborations
One of his notable collaborators is Chester A Wasik, with whom he has worked on various projects within the realm of silicon etching and related technologies.
Conclusion
Robert M Booth, Jr. is a notable inventor whose contributions to silicon etching technology have made a significant impact in the field. His innovative patent demonstrates his commitment to advancing manufacturing processes and improving product quality.