Robert J Whiting

Title: Innovations of Robert J Whiting

Introduction

Robert J Whiting is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma processing systems. His innovative work focuses on improving the efficiency and effectiveness of substrate temperature control during plasma processing.

Latest Patents

Robert J Whiting holds a patent for a "Predictive Wafer Temperature Control System and Method." This invention provides advanced plasma processing systems and methods for maintaining a set-point temperature for substrates during plasma processing. The system includes a plasma chamber, a controller, and an electrostatic power supply. The electrostatic chuck within the plasma chamber clamps the substrate in place while monitoring its temperature. The controller generates a control signal to adjust the substrate temperature to the desired set-point, ensuring optimal processing conditions.

Career Highlights

Robert J Whiting is associated with Novellus Systems Incorporated, where he has contributed to various innovative projects. His work has been instrumental in enhancing plasma processing technologies, which are crucial in semiconductor manufacturing. With a focus on precision and control, his inventions have paved the way for advancements in the industry.

Collaborations

Throughout his career, Robert has collaborated with talented individuals such as Vikram Singh and Paul K Shufflebotham. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Robert J Whiting's contributions to the field of plasma processing systems exemplify the spirit of innovation. His patent for predictive wafer temperature control demonstrates his commitment to advancing technology in semiconductor manufacturing. His work continues to influence the industry positively.