Company Filing History:
Years Active: 1992-1995
Title: The Innovations of Robert J Verbiar
Introduction
Robert J Verbiar is a notable inventor based in West Chester, PA (US). He has made significant contributions to the field of photopolymer technology, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
One of Verbiar's latest patents is titled "Exposure unit and method for exposing photosensitive materials." This invention involves an exposure unit that utilizes a source of radiation to expose photosensitive materials at various angles of incidence. The design includes an apparatus for moving the radiation source in a plane parallel to the photosensitive material, along with a reflector that optimizes the distribution of radiation angles.
Another significant patent is the "Process for dimensionally stabilizing photopolymer flexographic printing." This process enhances the dimensional stability of photopolymeric flexographic relief printing plates by post-exposing the surface of the printing plate to a high-intensity radiation source with a broad wavelength emission range of 200 to 700 nm.
Career Highlights
Robert J Verbiar is currently associated with E.I. du Pont de Nemours and Company, a leading organization in the field of science and technology. His work at this company has allowed him to develop and refine his innovative ideas, contributing to advancements in photopolymer applications.
Collaborations
Throughout his career, Verbiar has collaborated with esteemed colleagues such as Albert H Ohlig and Steven W Nelson. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Robert J Verbiar's contributions to the field of photopolymer technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the industry. His work continues to influence the future of photopolymer applications and printing technologies.