Robert J Nemanich

Title: The Innovations of Robert J Nemanich

Introduction

Robert J Nemanich is a notable inventor based in Cupertino, CA. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on the development of ohmic contacts for hydrogenated amorphous silicon.

Latest Patents

Nemanich holds a patent for a method of forming an ohmic contact between an amorphous silicon hydride semiconductor and a substrate. This innovative process involves coating a film of palladium on the substrate and overcoating it with a thin film of amorphous silicon hydride. This technique results in the formation of a thin palladium silicide layer. The amorphous silicon hydride is then dehydrogenated by annealing, which creates a highly defective amorphous silicon layer and a thicker palladium silicide layer. This allows carriers to tunnel readily through the layers. The amorphous silicon hydride semiconductor is subsequently coated over the amorphous silicon layer to achieve the desired thickness. Nemanich has 1 patent to his name.

Career Highlights

Robert J Nemanich has had a distinguished career at Xerox Corporation, where he has contributed to various projects in semiconductor research and development. His expertise in materials science and engineering has been instrumental in advancing the company's technological capabilities.

Collaborations

Nemanich has worked closely with his coworker, Malcolm J Thompson, on several projects. Their collaboration has led to advancements in semiconductor technology and has fostered innovation within their field.

Conclusion

Robert J Nemanich's contributions to semiconductor technology through his innovative patent and work at Xerox Corporation highlight his importance as an inventor. His advancements in ohmic contacts for hydrogenated amorphous silicon continue to influence the industry.