Company Filing History:
Years Active: 2000
Title: The Innovative Mind of Robert H. Stoever: A Pioneer in Plasma Processing Technology
Introduction: Robert H. Stoever, an inventive mind hailing from Atlantic Highlands, NJ, is known for his innovative contributions to plasma processing technology. With a focus on advancements that enhance semiconductor manufacturing, Stoever stands out as a prominent inventor in the field.
Latest Patents: Stoever holds an impressive patent titled "Showerhead Electrode for Plasma Processing." This invention features a plasma reactor showerhead electrode assembly designed specifically for processing semiconductor wafers. The assembly includes a silicon disk-shaped gas plate that incorporates multiple gas passage holes. It also features a distinctive graphite circular split collar assembly composed of first and second semicircular sections. These sections form a circumferential slot designed to secure the gas plate using a dovetail connection, ensuring efficiency and reliability in the processing environment. The integration of a conductive gasket allows for an electrically and thermally conductive seal, enhancing the overall functionality. Notably, the design permits easy disassembly for replacement of the gas plate, reflecting Stoever's commitment to user-friendly innovation.
Career Highlights: Throughout his career, Robert H. Stoever has consistently contributed to the advancement of plasma processing technologies. Working at M.E.C. Technology, Inc., he has dedicated his efforts to creating solutions that meet the evolving demands of the semiconductor industry. His work has been instrumental in enhancing manufacturing processes, which are critical to the production of modern electronic devices.
Collaborations: Stoever has collaborated with his talented coworkers, including Matthew Peter Szapucki and Richard Kulkaski. Their collective expertise and shared vision have undoubtedly contributed to the success of their projects at M.E.C. Technology, Inc., fostering an environment of innovation and exploration in the realm of plasma technologies.
Conclusion: Robert H. Stoever exemplifies the role of a forward-thinking inventor dedicated to improving the efficiency and effectiveness of semiconductor processing. His patent, the showerhead electrode for plasma processing, is a testament to his innovative spirit and commitment to technological advancement. As his career progresses, Stoever's contributions will no doubt continue to influence the field and inspire future generations of inventors.