Company Filing History:
Years Active: 1999-2001
Title: The Innovative Contributions of Robert G Van Der Heide
Introduction
Robert G Van Der Heide is a notable inventor based in Nashua, NH (US). He has made significant contributions to the field of aerosol surface processing, holding 2 patents that showcase his innovative approach to cleaning substrates.
Latest Patents
One of his latest patents involves a scheme for removing foreign material from the surface of a substrate by directing a high-velocity aerosol of at least partially frozen particles against the foreign material. This patent describes various methods for accelerating frozen particles to high velocities sufficient for effective particle removal. It includes the removal of organic layers, such as hard-baked photoresist or ion-implanted photoresist, as well as metallic layers. In one embodiment, liquid droplets are entrained in a high-velocity gas flow, and the resulting gas/liquid mixture is passed through an expansion nozzle to produce a high-velocity aerosol of frozen particles. Another embodiment involves entraining frozen aerosol particles in a sonic or supersonic gas jet before impacting the surface to be cleaned. The cleaning aerosols can be applied to substrates inside a vacuum chamber or directly from a hand-held device. Additionally, various scanning systems are described to achieve substantially uniform exposure of the substrate to the cleaning aerosol.
Career Highlights
Robert G Van Der Heide is currently employed at Sumitomo Heavy Industries, Ltd., where he continues to develop innovative solutions in his field. His work has significantly advanced the technology surrounding aerosol cleaning processes.
Collaborations
He has collaborated with notable coworkers, including Peter H Rose and Piero Sferlazzo, contributing to a dynamic and innovative work environment.
Conclusion
Robert G Van Der Heide's contributions to aerosol surface processing demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the challenges in substrate cleaning and offer practical solutions that can be applied in various industries.