East Windsor, NJ, United States of America

Robert Finley Drury



Average Co-Inventor Count = 1.3

ph-index = 3

Forward Citations = 77(Granted Patents)


Location History:

  • Roosevelt, NJ (US) (1978)
  • Hightstown, NJ (US) (1980)
  • East Windsor, NJ (US) (1992 - 2004)

Company Filing History:


Years Active: 1978-2004

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Robert Finley Drury

Introduction

Robert Finley Drury is a notable inventor based in East Windsor, NJ (US). He has made significant contributions to the field of thermal processing and photoresist removal, holding a total of 4 patents. His work has had a considerable impact on the technology used in printed circuit boards and photosensitive elements.

Latest Patents

Drury's latest patents include a "Method and apparatus for thermal processing a photosensitive element." This invention involves heating a composition layer on a flexible substrate to a melt temperature while maintaining the substrate at a lower temperature. The process includes pressing a heated absorbent layer against the composition layer and repeating these steps for multiple cycles. Another significant patent is the "Stripping method for removing resist from a printed circuit board." This method utilizes a solid particulate blast process to remove processed photoresist images without damaging the underlying circuitry, employing polymeric particles with specific hardness as the blast media.

Career Highlights

Robert Finley Drury is currently associated with E.I. DuPont De Nemours and Company, where he continues to innovate and develop new technologies. His expertise in thermal processing and photoresist removal has positioned him as a valuable asset in his field.

Collaborations

Drury has collaborated with notable coworkers, including Melvin H Johnson and David Anthony Belfiore. Their combined efforts have contributed to advancements in their respective areas of expertise.

Conclusion

Robert Finley Drury's innovative work and patents have significantly advanced the fields of thermal processing and photoresist removal. His contributions continue to influence technology in the industry today.

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