Robert B Oswald, Jr

Title: The Innovations of Robert B Oswald, Jr.

Introduction

Robert B Oswald, Jr. is a notable inventor based in Bethesda, MD (US). He has made significant contributions to the field of optical materials and electron beam technology. With a total of 2 patents, his work has advanced the understanding and application of these technologies.

Latest Patents

Oswald's latest patents include a method for producing optical baffling material using pulsed electron and a method for controlling low-energy high current density electron beams. The first patent describes a process for creating durable optical baffling materials by polishing the surface of a fine-grained starting material and bombarding it with low-energy pulsed electrons. This method results in a surface that appears completely black, losing its initial mirror-like properties. The second patent outlines an apparatus for controlling the angle of incidence of low-energy, high current density electron beams. This innovative approach allows for precise adjustments of the electron beam's angle, enhancing the reliability of the technology.

Career Highlights

Oswald works for the US Government as represented by the Secretary of the Army. His role involves applying his expertise in developing advanced materials and technologies that support various military applications. His contributions have been instrumental in enhancing the capabilities of the systems he works on.

Collaborations

One of his notable collaborators is John N Lee. Together, they have worked on projects that leverage their combined expertise in materials science and electron beam technology.

Conclusion

Robert B Oswald, Jr. is a distinguished inventor whose work has significantly impacted the fields of optical materials and electron beam technology. His innovative patents and career contributions reflect his commitment to advancing these technologies.