Company Filing History:
1 out of 178 
1 out of 47 Years Active: 2008
Title: Rita De Waele: Innovator in Semiconductor Cleaning Technologies
Introduction
Rita De Waele is a notable inventor based in Hasselt, Belgium. She has made significant contributions to the field of semiconductor technology, particularly in the area of cleaning methods for semiconductor substrates. With a total of 2 patents to her name, her work has garnered attention for its innovative approaches.
Latest Patents
Rita's latest patents focus on a composition and method for treating semiconductor substrates. The first patent describes a method for cleaning semiconductor surfaces to achieve the removal of all kinds of contamination, including particulate, metallic, and organic materials, in a single cleaning step. This method employs a cleaning solution that is stable and minimizes or eliminates metal precipitation on the semiconductor surface. The second patent reiterates this innovative approach, emphasizing the efficiency and effectiveness of her cleaning solution.
Career Highlights
Throughout her career, Rita has worked with esteemed organizations such as the Interuniversitair Microelektronica Centrum (imec) and Interuniversitair Microelektronica Centrum (imec, Vzw). Her experience in these institutions has allowed her to develop and refine her innovative cleaning methods, contributing to advancements in semiconductor technology.
Collaborations
Rita has collaborated with various professionals in her field, including her coworker Rita Vos. These collaborations have further enriched her research and development efforts, leading to impactful innovations.
Conclusion
Rita De Waele's contributions to semiconductor cleaning technologies highlight her role as a pioneering inventor. Her patents reflect her commitment to advancing the field and improving the efficiency of semiconductor manufacturing processes.