Company Filing History:
Years Active: 2002
Title: Richard W Sheppe, Jr: Innovator in Substrate Hydration Measurement
Introduction
Richard W Sheppe, Jr. is an accomplished inventor based in Post Mills, VT (US). He has made significant contributions to the field of substrate hydration measurement. His innovative approach has led to the development of a unique method and apparatus that enhances our understanding of substrate hydration.
Latest Patents
Richard W Sheppe, Jr. holds a patent for a "Method and apparatus for measuring relative hydration of a substrate." This invention focuses on measuring the electrical characteristics of a substrate, along with the force applied and the temperature during the measurement process. These inputs are crucial for determining the relative hydration of the substrate, showcasing his expertise in this specialized area.
Career Highlights
Sheppe is associated with Nova Technology Corporation, where he applies his knowledge and skills to advance technological solutions. His work at the company reflects his commitment to innovation and excellence in the field.
Collaborations
Throughout his career, Richard has collaborated with notable colleagues, including Michael J E Campbell and Michael L Gallant. These partnerships have contributed to the development of his innovative ideas and patents.
Conclusion
Richard W Sheppe, Jr. is a notable inventor whose work in measuring substrate hydration has made a significant impact in his field. His dedication to innovation continues to inspire advancements in technology.