Lakewood, NJ, United States of America

Richard T Lareau

This inventor holds 1 USPTO granted patent. Top assignee: US Government as Represented by the Secretary of the Army. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard T Lareau. Retrieved from https://idiyas.com/inventor/richard-t-lareau

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Richard T. Lareau: Innovator in Thin Film Measurement

Introduction

Richard T. Lareau is a notable inventor based in Lakewood, NJ (US). He has made significant contributions to the field of measurement technology, particularly in the area of thin film thickness measurement. His innovative approach has garnered attention for its simplicity and efficiency.

Latest Patents

Richard T. Lareau holds a patent for a "Method for measuring thin film thickness." This method provides a straightforward technique for determining the thickness of layers as thin as 1-2 nm. Although the method is destructive, it consumes very little material, making it a valuable tool in various applications.

Career Highlights

Lareau is currently employed by the U.S. Government as represented by the Secretary of the Army. His work in this capacity has allowed him to apply his expertise in measurement technology to support military and defense initiatives.

Collaborations

Throughout his career, Richard has collaborated with notable colleagues, including Donald W. Eckart and Luis M. Casas. These partnerships have contributed to the advancement of measurement techniques and innovations in their respective fields.

Conclusion

Richard T. Lareau's contributions to the field of thin film measurement exemplify the impact of innovative thinking in technology. His patent and work with the U.S. Government highlight the importance of precision in measurement and its applications in various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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